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| 次世代光媒介‧光學設備用材料
Optical Medium Optical Materials |
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記録膜用
for recording films |
Ge+α（Bi,
In, Te....）, Bi4Ti3Sn,
GeSbTe,
AgGeSbTe, GeSbTe
etc. |
保護膜用
for protective films |
ZnS-SiO2,
Al2O3,
NbOx,
ZnO-α, SiC, Si3N4,
B-Si, SiO2,
SiAlNx etc. |
反射膜用
for reflective films |
Ag合金(TOSHIMA
“AGC-series”)
Al合金etc. |
界面層・誘電体層用
for interfacial layer |
Cr2O3,
GeCr, GeAl, SiC, AlN, TiO2
Nb2Ox,
ZrO2,
Ta-SiO2,
Nb-SiO2,
ZnO etc. |
反射防止（AR）膜用
for antireflection layer |
High-n：TiO2,
Nb2Ox,
SrTiO3
etc.
Low-n：SiO2,
SiAlN etc. |
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| TOSHIMA always lay emphasis on development,
creation new material for thin film aiming to the tip of new
generations. |
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Co., LTD. 10459台灣台北市中山區松江路168號7樓
TEL : +886-2-25711191#850 FAX : +886-2-25641810
E-mail Address : alanchien@panel.com.tw |
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