HDD- Hard Disk Materials
Display Materials
Ferroelectrics & Electrode Materials
Superconductor Materials
Battery
Thermoelectric Materials
Optical Medium Optical Materials
For recording film Ge+α(Bi, In, Te....), Bi4Ti3Sn, GeSbTe,
AgGeSbTe, GeSbTe etc.
For protective film ZnS-SiO2, Al2O3, NbOx, ZnO-α, SiC, Si3N4,
B-Si, SiO2, SiAlNx etc.
For reflective film Ag合金(TOSHIMA “AGC-series”)
Al合金etc.
For interfacial layer Cr2O3, GeCr, GeAl, SiC, AlN, TiO2
Nb2Ox, ZrO2, Ta-SiO2, Nb-SiO2, ZnO etc.
For antireflection layer High-n:TiO2, Nb2Ox, SrTiO3 etc.
Low-n:SiO2, SiAlN etc.
TOSHIMA always lay emphasis on development, creation new material for thin film aiming to the tip of new generations.
 
Nb2Ox
ZnS-SiO2
Panel Trading Co.,LTD.
7th Floor,No.168,Song-Jiang Road,Zhong-Shan District,Taipei City 10459,Taiwan.
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E-mail Address : alanchien@panel.com.tw